Non-reactive metal/semiconductor interfaces: a combined AES, AFM andPAC study

  1. Krausch, G.
  2. Colchero, J.
  3. Detzel, T.
  4. Fink, R.
  5. Luckscheiter, B.
  6. Wöhrmann, U.
  7. Schatz, G.
Journal:
Hyperfine Interactions

ISSN: 0304-3834 1572-9540

Year of publication: 1993

Volume: 78

Issue: 1-4

Pages: 295-301

Type: Article

DOI: 10.1007/BF00568151 GOOGLE SCHOLAR